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Portail > Offres > Offre UMR5129-MARCLO-036 - Post-Doc dans le domaine de la métrologie dimensionnelle à l'échelle nanométrique (H/F)

Post Doc in the field of dimensional metrology at the nanoscale (M/F)

This offer is available in the following languages:
Français - Anglais

Date Limite Candidature : vendredi 23 octobre 2020

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General information

Reference : UMR5129-MARCLO-036
Date of publication : Friday, October 02, 2020
Type of Contract : FTC Scientist
Contract Period : 24 months
Expected date of employment : 1 December 2020
Proportion of work : Full time
Remuneration : Between 2648.79 à 3054.06€ gross monthly
Desired level of education : PhD
Experience required : 1 to 4 years


This job proposal is part of the European MadeIn4 project in which the LTM and LETI are involved in particular on aspects of dimensional metrology at the nanometric scale. In the field of nanotechnologies, the reduction of the dimension of patterns as well as the increase of their geometric complexity makes the dimensional metrology step critical. Conventional techniques such as SEM, AFM or scatterometry, although performing well on some aspects, show their limits to deliver a robust result. The subject proposed here is positioned in an approach of hybridization of metrology techniques in order to improve this robustness. This hybridization will especially take into account the contribution of a new technique: CDSAXS. This metrology using X-rays and previously only available on synchrotron lines, is gradually becoming more democratic with the development of "benchtop" equipment. The samples on which the measurements will be carried out will be supplied by ST Microelectronics and will correspond to reference standards. In addition to dimensional parameters such as height, width or edge inclination, the roughness on the flanks of the patterns can also be taken into account in order to have the most complete approach. The hybridization of techniques will be done by developing machine learning tools.


During this project, the candidate will have an activity on several aspects related to metrology. The experimental part will allow to measure the samples by means of the various tools mentioned above. Given the difficulty to carry out a significant quantity of measurements (in terms of time and availability of equipment) a significant modeling part will also be implemented in order to reconstruct by simulation and for the different techniques, the expected signatures. These simulated results will be the basis of the machine learning tools that will also be implemented for the stated problem.
Of course, previous work has already allowed progress on some parts and the work presented here will benefit from these advances.


The skills required are at the experimental level of dimensional metrology techniques. A good knowledge of some of them is important. The candidate will also have to show a strong interest in software development, for the modeling part but especially for the development of machine learning tools and the use of associated open source libraries.
Moreover, as the project is part of a collaboration between 2 laboratories, the candidate will have to show a pro activity, autonomy, a positive attitude and a willingness to exchange scientific information.

Work Context

The proposed work is part of a close collaboration between the LTM/CNRS/UGA and the LETI/DPFT/SMCP/LPMS.
The LTM is a joint research unit CNRS/University Grenoble Alpes, with 4 research teams and about 90 people. The laboratory is located on the CEA-LETI site in Grenoble. The candidate will be recruited in the Metrology & Modeling group of the Advanced Lithography team.
LETI is an institute of CEA and is a major player in the development of micro and nanotechnologies worldwide. The LPMS is one of the 3 laboratories of the SMCP, Service de Métrologie et Caractérisation Physique (Metrology and Physical Characterization Department), which gathers nearly 120 people. It is part of Minatec's Nanocharacterization Platform, which is one of the largest in Europe.

Constraints and risks


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