Faites connaître cette offre !
Reference : UMR5129-MARCLO-015
Workplace : GRENOBLE
Date of publication : Friday, February 21, 2020
Type of Contract : FTC Scientist
Contract Period : 12 months
Expected date of employment : 1 May 2020
Proportion of work : Full time
Remuneration : between 2648.79 to 3054.06€ € gross monthly
Desired level of education : PhD
Experience required : Indifferent
For nitride semiconductors, localised epitaxy processes are aimed at reducing dislocation densities but result in the formation of grain boundaries upon coalescence of the neighbouring slightly misoriented crystallites. In order to cope with this issue, it is possible to develop an original localized epitaxy process whereby the individual crystallites are grown by nano-pendeo epitaxy on small dimension and deformable SOI pedestals; this allows the crystallites to align crystallographically with one another rather than forming grain boundaries. Such an original process opens up new horizons in the field of epilayer growth and particularly for µ-display LEDs. Our recent results prove that strain free and almost dislocation free GaN vignettes can be obtained this way with dimensions from a few 10s of µm to a few 100s µm. These vignettes are easily detachable, thus opening new possibilities for easy transfer processes.
We now need to go a step further in order to promote progressive coalescence of the crystallites instead of instant coalescence. This goes through specific SOI nano-pattern geometries rather than the simple periodic pattern. The post-doctoral work will be dedicated to this goal. In particular, bio-inspired pattern geometries that would allow reproducing the progressive growth of plants for instance will be tested. The structural and optical analysis of epitaxial vignettes grown by MOVPE on these specifically nano-patterned SOI will be used as a feedback for the choice of the most adequate pattern geometries. Finally, the obtained vignettes will be processed in order to make self supported µ-LEDs.
Technological processes, nanoimprint, lithography, metal evaporation, plasma etching
- Theoretical knowledge
- Operational know-how: Experience in a clean room
- Social skills: easy interaction with multiple collaborators
The Laboratory of Technologies for Microelectronics (LTM) is a public research laboratory affiliated to CNRS and Grenoble Alpes University, and hosted by CEA LETI. LTM is composed of one hundred people (including PhD and post-docs). The main mission of LTM teams is to develop and characterize processes and materials required for advanced nanoelectronics components and other integrated devices such as in photonics, microfluidics. LTM has access to a wide range, state of the art, of microfabrication tools located in high standard clean room as well as to a batch of structural and physical characterisation. LTM researchers have a strong expertise in lithography techniques, including nanoimprint lithography, and plasma etching processes.
Constraints and risks
We talk about it on Twitter!