Advanced a-SiC Thin Films for Photonic Integrated Circuits (DC2) M/F
New
- FTC PhD student / Offer for thesis
- 36 mounth
- Doctorate
Offer at a glance
The Unit
Sciences et Ingénierie, Matériaux, Procédés
Contract Type
FTC PhD student / Offer for thesis
Working hHours
Full Time
Workplace
38402 ST MARTIN D HERES
Contract Duration
36 mounth
Date of Hire
01/10/2026
Remuneration
2600 € gross monthly
Apply Application Deadline : 08 April 2026 23:59
Job Description
Thesis Subject
CNRS-Grenoble INP-Université Grenoble Alpes seeks a highly motivated candidate for a fully funded 36-month PhD position focused on thin-film deposition for photonic applications.
This position is part of the "Silicon Carbide Photonic Integrated Circuit (SiCPIC)" project, a prestigious European Doctoral Network funded by the EU's Horizon Europe program under the Marie Sklodowska-Curie Action (MSCA, Grant Agreement No. 101227010).
• International collaboration: The PhD candidate will join a team of 15 doctoral researchers across five European countries, partnering with five universities and industrial partners.
• Industrial partnership: The thesis is conducted in collaboration with PlasmaTherm Europe.
• Research focus: All 15 PhD projects fall under the project theme of Silicon Carbide on Insulator (SiCOI) devices and integration for applications in classic and quantum optical telecommunication and optical sensing.
The project will be based at CNRS-Grenoble INP-Université Grenoble Alpes (France), with secondments at SiCPIC partners (Plasma-Therm, DTU, PoliTO).
For amorphous SiCOI stacks the identification of the best processing route exhibiting the most favourable optical properties is important. The understanding of the links between the structural properties of the thin films and the optical/electrical properties is of key importance to design highly efficient and reproducible photonics devices. To achieve this goal, the doctoral candidate will investigate the optimization of inductive coupled plasma chemical vapor deposition (ICPCVD) and plasma enhanced chemical vapor deposition (PECVD) thin films. A methodical approach, combining advanced experiments and Design of Experiments (DoE), will explore links between deposition parameters, film chemistry, and optical/electrical properties. Special focus will be given to annealing effects (laser/thermal) on stability and performance, using ex-situ and in-situ characterization.
The candidate will be trained in plasma process engineering (ICPCVD/PECVD), experimental design (statistical/numerical methods), and multi-scale thin-film characterization (structural, chemical and optical characterisations )
Expected outcomes:
- Deep understanding of ICPCVD/PECVD deposition mechanisms and the links with the film physico-chemistry (structure, stress, composition), and optoelectronic properties.
-Optimization of post-deposition annealing (laser/thermal) to enhance device stability and performance.
-Contribution to a-SiC integration in classical/quantum photonic circuits, in synergy with academic and industrial partners.
Qualifications: Candidates must have a two-year master's degree or a similar degree with an academic level equivalent to a two-year master's degree in material science, process engineering or similar.
Skills : Critical thinking, Research design, Presentation abilities, Teamwork, Time management, Organization and Interdisciplinary approach. Good skills in numerical methods and statistical analysis is required, very good English (written/spoken).
Your Work Environment
SIMaP (Science et Ingénierie des Matériaux et Procédés – UMR 5266), a joint research unit of CNRS, Grenoble INP, and Université Grenoble Alpes, is a center of excellence in materials science and innovative processes. It spans diverse fields—from metallurgy to nanomaterials and energy materials—and is equipped with state-of-the-art research facilities.
Embedded in a dynamic network of industrial and academic collaborations, SIMaP provides an ideal environment for ambitious doctoral research, supported by rigorous scientific supervision. The team hosting the PhD candidate is internationally recognized for its expertise in materials science and process engineering, particularly in thin films.
As a participant in the SiCPIC project, the PhD student will become part of a team at CNRS-Grenoble INP, with expertise in synthesis and characterization of thin films for functional applications. The activities within the project will benefit from synergies with other projects in the group as well as with other activities at the institute.
Compensation and benefits
Compensation
2600 € gross monthly
Annual leave and RTT
44 jours
Remote Working practice and compensation
Pratique et indemnisation du TT
Transport
Prise en charge à 75% du coût et forfait mobilité durable jusqu’à 300€
About the offer
| Offer reference | UMR5266-FREMER-004 |
|---|---|
| CN Section(s) / Research Area | Materials, nanomaterials and processes chemistry |
About the CNRS
The CNRS is a major player in fundamental research on a global scale. The CNRS is the only French organization active in all scientific fields. Its unique position as a multi-specialist allows it to bring together different disciplines to address the most important challenges of the contemporary world, in connection with the actors of change.
Create your alert
Don't miss any opportunity to find the job that's right for you. Register for free and receive new vacancies directly in your mailbox.