Missions

The primary objective of this project is to fabricate and study high-precision position-sensitive photosensors based on the epitaxial growth of active materials, such as functional oxides, on Silicon technology.

Activities

The work comprises three main tasks: (1) the development of an industrial process that will make it possible to grow active thin films on 6-inch Silicon wafers, (2) the fabrication and characterization of 3 ranges of high-precision position-sensitive photo sensors (10 x 10 cm2, 5 x 5 cm2, 1 x 1 cm2) fabricated on 6-inch wafers, and (3) encapsulation with or without integrated optics, with on-board electronics and software for potential commercialization.

Skills

The candidate for this position will hold a PhD in the physics and chemistry of materials, with expertise in the synthesis of functional oxide thin films by chemical means, nanostructuring of thin films, and the manufacture of electronic components.

Work Context

The Institute of Electronics and Systems (IES) is a Joint Research Unit between the CNRS and the University of Montpellier (IES, UMR n°5214 CNRS-UM). The unit is divided into ten research teams of varying size covering the thematic axes of photonics and waves, materials, energy, reliability of systems in constrained environments and sensors and instrumentation.

Constraints and risks

This position is located in a sector falling under the protection of scientific and technical potential (PPST) and therefore requires, in accordance with regulations, that your arrival be authorized by the competent authority of the Ministry of Higher Education and Research ( MESR)