PhD student in Deep study and optimization acceleration of 2D h-BN epitaxy and its high-quality layered heterostructures using artificial intelligence (M/F)

New

GEORGIATECH-CNRS

METZ • Moselle

  • FTC PhD student / Offer for thesis
  • 36 months
  • Doctorate

This offer is available in English version

This offer is open to people with a document recognizing their status as a disabled worker.

Offer at a glance

The Unit

GEORGIATECH-CNRS

Contract Type

FTC PhD student / Offer for thesis

Working hHours

Full Time

Workplace

57070 METZ

Contract Duration

36 months

Date of Hire

05/10/2026

Remuneration

2300 € gross monthly

Apply Application Deadline : 23 September 2026 23:59

Job Description

Thesis Subject

This PhD thesis will be carried out within the framework of the DIADEM REBORN Project.
Hexagonal boron nitride (h-BN) is an emerging two-dimensional (2D) material with highly attractive properties for optoelectronic applications. It is attracting increasing interest for the development of next-generation electronic and optoelectronic devices.
The epitaxial growth of GaN on h-BN offers promising opportunities for the development and large-scale manufacturing of optoelectronic devices. In particular, this approach is compatible with standard industrial reactors and can potentially be integrated into conventional epitaxial processes used for the fabrication of active GaN-based devices.
However, the growth of III-nitride materials on h-BN by metal-organic vapor-phase epitaxy (MOVPE) remains a significant scientific and technological challenge. The complexity of the growth environment and the underlying mechanisms requires a comprehensive understanding of the physical and chemical phenomena involved in order to optimize the structural, optical, and electrical properties of GaN and related heterostructures.
The objective of this PhD project is therefore to contribute to a significant improvement in the quality of GaN-based materials and heterostructures grown epitaxially on h-BN. The project will combine advanced materials characterization techniques with artificial intelligence (AI)-assisted optimization of epitaxial growth parameters. This approach will enable the identification of the most relevant growth parameters and the establishment of correlations between epitaxial conditions and the resulting material and device properties.
PhD Research Activities
Within the framework of the REBORN Project, the PhD student will contribute to the development of the different technological building blocks required for the MOVPE growth of GaN-based heterostructures on h-BN, as well as their integration into optoelectronic devices.
The research activities will include:
Development and optimization of MOVPE epitaxial growth processes;
Investigation of the influence of growth parameters on the properties of GaN-based layers and heterostructures;
Fabrication and optimization of devices based on the developed heterostructures;
Advanced characterization of materials and devices using techniques including X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), photoluminescence (PL), cathodoluminescence (CL), and electrical measurements;
Analysis and interpretation of experimental data to establish correlations between growth conditions, material properties, and device performance;
Development of AI-based approaches for the optimization of epitaxial growth processes;
Dissemination and valorization of the research results through scientific publications and presentations at international conferences.
This PhD thesis will provide a multidisciplinary research environment at the interface of materials science, semiconductor epitaxy, optoelectronics, advanced characterization, and artificial intelligence, with the aim of developing novel GaN/h-BN technological platforms for next-generation optoelectronic devices.

Your Work Environment

This research will be carried out in the context of IRL 2958 GT-CNRS, a joint international laboratory between the Georgia Institute of Technology and CNRS, under the direction of Prof. Abdallah Ougazzaden, a specialist in semiconductor epitaxy. Like any research project, this project is a collaboration with a set of national partners from different fields and will therefore require a certain amount of collaborative work and communication.

Constraints and risks

-Work in a bilingual environment; meticulous work in a cleanroom. This position is in a sector subject to scientific and technical security (PPST) regulations and therefore, in accordance with these regulations, requires that your employment be authorized by the competent authority at the Ministry of Higher Education and Research (MESR).

Compensation and benefits

Compensation

2300 € gross monthly

Annual leave and RTT

44 jours

Remote Working practice and compensation

Pratique et indemnisation du TT

Transport

Prise en charge à 75% du coût et forfait mobilité durable jusqu’à 300€

About the offer

Offer reference IRL2958-CRICOR-045
Relevant experience 1 to 4 years

About the CNRS

The CNRS is a major player in fundamental research on a global scale. The CNRS is the only French organization active in all scientific fields. Its unique position as a multi-specialist allows it to bring together different disciplines to address the most important challenges of the contemporary world, in connection with the actors of change.

CNRS

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PhD student in Deep study and optimization acceleration of 2D h-BN epitaxy and its high-quality layered heterostructures using artificial intelligence (M/F)

FTC PhD student / Offer for thesis • 36 months • Doctorate • METZ

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