En poursuivant votre navigation sur ce site, vous acceptez le dépôt de cookies dans votre navigateur. (En savoir plus)
Portail > Offres > Offre UMR5270-SYLGON-046 - CDD Checheur H/F: "fabrication et caractérisation de motifs obtenus par photolithographie et faisceau d’électrons et de leur transfert par plasma de gravure : Etude mécanistique et qualitative de l’utilisation de résines de lithographie vertes »

M/F Post doctoral fellowship entitled “Fabrication and characterization of features obtained by photolithography and electron-beam and their transfer by plasma etching: Mechanistic and qualitative study of the use of green lithography resists”

This offer is available in the following languages:
- Français-- Anglais

Date Limite Candidature : jeudi 21 mars 2024

Assurez-vous que votre profil candidat soit correctement renseigné avant de postuler

Informations générales

Intitulé de l'offre : M/F Post doctoral fellowship entitled “Fabrication and characterization of features obtained by photolithography and electron-beam and their transfer by plasma etching: Mechanistic and qualitative study of the use of green lithography resists” (H/F)
Référence : UMR5270-SYLGON-046
Nombre de Postes : 1
Lieu de travail : ECULLY
Date de publication : jeudi 8 février 2024
Type de contrat : CDD Scientifique
Durée du contrat : 25 mois
Date d'embauche prévue : 1 mai 2024
Quotité de travail : Temps complet
Rémunération : From 2935 Euros gross per month, depending on experience
Niveau d'études souhaité : Niveau 8 - (Doctorat)
Expérience souhaitée : 1 à 4 années
Section(s) CN : Micro and nanotechnologies, micro and nanosystems, photonics, electronics, electromagnetism, electrical energy

Missions

The Horizon Europe project "Resin Green" is a collaborative project that aims at developing "green" lithography resists for micro and nanofabrication processes in microelectronics.

To achieve these different objectives, the person will work in various laboratory environments (clean rooms, chemistry rooms) for the micro-nanofabrication steps (lithography-etching-deposition) and characterization labs (the consortium has surface analysis instruments such as time-of-flight secondary ion mass spectrometry (ToF-SIMS), Fourier transform infrared (FTIR), X-ray induced photoelectron spectroscopy (XPS), electron microscopy (SEM, TEM), atomic force microscopy (AFM)... ).

Keywords:
Micro-nano fabrication, Plasma etching, Resist, Biosourced polymers, chitosan, alginate.

References
Caillau et al, J. Vac. Sci. Technol. (2017), 35, 06GE01
Sysova et al, ACS Appl. Polym. Mater. (2022), 4, 6, 4508–4519
Servin et al, Appl. Mater. Interf. (2023), 15, 18685-18693
Durin et al, J. Vac. Sci. Technol. (2023), DOI 10.1116/6.0002934

Activités

As part of this project, the post-doctoral fellow recruited will have to:
- study the use of bio-based polymers for lithography, in particular chitosan, using electron beams and UV irradiation (from EUV to UV).
- study the interactions of these resists containing different formulation additives with etching plasmas, especially fluorinated plasmas,
- study the quality of patterns transferred by reactive plasma to the substrate.
The post-doctoral fellow will be funded by the Horizon Europe "Resin Green" project and will be hired as a CNRS CDD Researcher.
Work will be carried out at the Institut des Nanotechnologies de Lyon (INL, https://inl.cnrs.fr/) and at ISA (https://www.isa-lyon.fr/) under the supervision of Dr JL Leclercq, Dr Y. Chevolot and Pr D. Léonard. As part of the project, the post-doctoral fellow will work closely with IS2M (Mulhouse), IMP (Lyon) and CEA-Leti (Grenoble), and more generally with all project partners (Greece/Germany/Switzerland). The post-doctoral fellow will participate actively in the consortium progress meetings and any other additional meetings required for the expected progress of the project.

Compétences

The post-doctoral fellow must hold a PhD. The post-doctoral fellow must have a solid background in chemistry, physical chemistry, materials science, characterization techniques and/or plasmas. Knowledge on surface characterization techniques, in particular ToF-SIMS and XPS, will be appreciated. A high level of oral and written communication skills in English is required to interact with consortium partners, present work at international meetings and conferences, and write scientific reports and publications.
In addition, as this project is at the interface of chemistry, materials, micro/nano fabrication processes including lithography, and plasma physical chemistry, the post-doctoral fellow will need to demonstrate a strong motivation for a multi-disciplinary project with a thirst for knowledge. The awarded fellow should be autonomous and proactive. The post-doctoral fellow must also be able to work in a team on multidisciplinary projects.

Contexte de travail

The post-doctoral fellow will have to divide his/her time between the two laboratories INL and ISA. The hiring will be subject to the approval of the Security/Defence Officer and, for foreign candidates, to the issue of the working visa procedure. The security/defence procedure takes two months to be completed, and an additional month may be required to draw up the contract.
Working in cleanrooms: on-site workstation training
Chemical risk: awareness and prevention, on-site training
Compulsory PPE
Travel in France and abroad

Le poste se situe dans un secteur relevant de la protection du potentiel scientifique et technique (PPST), et nécessite donc, conformément à la réglementation, que votre arrivée soit autorisée par l'autorité compétente du MESR.