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Reference : UMR5129-MARCLO-051
Workplace : GRENOBLE
Date of publication : Wednesday, October 13, 2021
Type of Contract : FTC Scientist
Contract Period : 12 months
Expected date of employment : 1 January 2022
Proportion of work : Full time
Remuneration : Between 2663€ to 3069€ gross monthly
Desired level of education : PhD
Experience required : 1 to 4 years
The context of this position is the development of technological processes for the growth of GaN material on Si with low defect rate. The localized growth of GaN is supposed to reduce the dislocation density, but results in the formation of grain boundaries during the coalescence of disoriented neighboring crystallites. It is possible to circumvent this limitation by a pendeo-epitaxy approach on SOI substrates, i.e. by growing the material on deformable pillars. Such an approach opens new perspectives for the realization of µLED devices. We have already achieved low defect rates, but the processes still need to be optimized to lead to a possible transfer. In particular, we need to study new geometries and distribution at the pillar level, and to develop complete technological pathways for the realization of µLEDs. The person recruited will have to take charge of nanofabrication processes including nanoimprint lithography and plasma etching steps. He/she will have to optimize these processes as they progress. She will also have to develop a technological pathway to realize different types of electrodes on the devices. The work will be done in a clean room, on the Upstream Technology Platform (PTA) and on the LTM etching equipment. She will have access to the nanofabrication equipment, but also to all the characterization tools necessary to analyze the developed processes.
Technological processes, nanoimprint, lithography, metal evaporation, plasma etching
- Theoretical knowledge
- Operational skills: experience of working in a technology clean room
- Soft skills: easy interaction with multiple collaborators
The LTM is a joint CNRS/University of Grenoble Alpes research unit, comprising 6 teams, 4 of which are research teams, and has a staff of about 90. The laboratory is located on the CEA-LETI site in Grenoble. This project is carried out within the framework of the activities of the "advanced lithography" team in which various patterning techniques are developed, including nanoimprint lithography. The person recruited will benefit from the expertise in nanofabrication of all the staff of the team.
Constraints and risks
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