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Portal > Offres > Offre UMR5129-MARCLO-016 - Post doctorat (H/F) Développement et caractérisation in situ de procédés ASD avec SAM (Self-Assembled Monolayers)

Post doctoral position (F/M) : Development and in situ characterization of ASD processes with SAM

This offer is available in the following languages:
Français - Anglais

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General information

Reference : UMR5129-MARCLO-016
Workplace : GRENOBLE
Date of publication : Monday, March 02, 2020
Type of Contract : FTC Scientist
Contract Period : 12 months
Expected date of employment : 1 June 2020
Proportion of work : Full time
Remuneration : beetween 2648.79 à 3054.06€ gross month
Desired level of education : PhD
Experience required : Indifferent


In the case of high k/metal memories, dimensional scaling (thicknesses of about tens of nm) imposes stringent requirements on fabrication processes. In the context of increased miniaturization, Area Selective Deposition (ASD) processes have recently attracted an increased interest, as a very promising route for the development of bottom-up growth processes, to circumvent increasingly expensive thin layer nano patterning processes. More specifically, advanced 3D architectures drive most current microelectronic scaling efforts toward the development of topographic selective deposition to produce coating either on the horizontal or on the vertical surfaces of a 3D trenched or pillared structure.
In this project, the candidate will work on the development of an ASD process using SAMs (Self-Assembled Monolayers). The first part of the project will be dedicated to in situ and ex situ characterization of the SAMs in order to develop a robust metrology of these monolayers. Then the impact of the ALD steps on the SAMs degradation will be studied. Finally, an optimized 3D ASD process with SAMS will be proposed.


-In situ and ex situ characterization of SAMs by ellipsometry, XPS XRR,…
-Development of ALD and PEALD processes
-OES diagnostics
-Work in clear room


-The candidate must have a doctorate in chemistry, physics or material science.
-A strong background in ALD and plasma enhanced ALD (PEALD) processes is mandatory.
-Background in one or several thin film characterization technics such as XPS and ellipsometry is mandatory.
-Knowledge of SAMs elaboration and characterization is a strong plus.
-The candidate must have very strong interpersonal and analytical skills since this work is made in collaboration between two laboratories and different teams, and is also part of a European project. The candidate will have to write reports and make oral presentations in European meetings.

Work Context

This work is part of the European project WakeMeUp whose objectives are to improve and understand reliability and endurance of resistive memories.
The candidate will work in LTM laboratory in collaboration with CEA/LETI (French academic laboratory located in CEA/LETI are in Grenoble).
The candidate will work under the supervision of M. Bonvalot, B. Pelissier, and C. Vallée from LTM and R. Gassilloud from CEA/LETI.

Constraints and risks

Most of the wok will be made in clean room environment

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