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Portail > Offres > Offre UMR5129-ERWPAR-005 - Postdoc (H/F) en Fabrication de guides d'onde Si ultra faible perte pour la photonique intégrée sur Silicium

Postdoc (M/F) in Fabrication of ultra low loss waveguides for Si integrated photonics

This offer is available in the following languages:
Français - Anglais

Date Limite Candidature : vendredi 4 février 2022

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General information

Reference : UMR5129-ERWPAR-005
Workplace : GRENOBLE
Date of publication : Friday, January 14, 2022
Type of Contract : FTC Scientist
Contract Period : 12 months
Expected date of employment : 1 April 2022
Proportion of work : Full time
Remuneration : 2663.79€ a 3069.06€
Desired level of education : PhD
Experience required : 1 to 4 years


The objective of this project is to fabricate ultra low loss SiN and Si waveguides for integrated silicon photonics (inferior to dB / cm). One of the main sources of optical losses in a guide are the scattering losses due to the waveguide sidewalls roughness after plasma patterning. Thus, a first objective is to develop and optimize plasma etching processes to pattern waveguides with minimal sidewalls roughness. A promising approach is to use pulsed plasma technologies, available at the LTM / CNRS, which offer a multitude of possibilities for patterning materials without damage. On the other hand, to eliminate other sources of loss such as absorption losses, annealing treatments or other capping strategies will be proposed. These developments will be based on a detailed understanding of the physicochemical modifications of the materials subjected to various treatments and are aimed to identify the optimal conditions for minimizing optical losses.


The work will be carried out in the LTM 200 and 300mm etching reactors located in the CEA / Leti clean rooms, the 300mm reactor being equipped with pulsed plasma technologies. The candidate will also have access to a panel of material characterization techniques available in the clean room.
-Development and characterization of plasma etching processes of Si and SiN waveguides
-Comparison of performance of continuous and pulsed plasma processes in terms of waveguide morphology
-Development and characterization of annealing treatment to further smooth the waveguides or modify their optical properties
-Development of capping strategy other than SiO2
- Characterization of the optical losses of the waveguides and comparison of the performances obtained according to the established process
-Valuation of results in the form of articles or communications at conferences


1) Theoretical knowledge: plasma etching mechanisms, materials science, basics on linear and non-linear optics will be appreciated
2) Technical skills:
-Development and characterization of Plasma etching processees (morphology by SEM, MEB-CD, ellipsometry and roughness by AFM and MEB-CD)
-Characterization of materials (XPS, FTIR, ellipsometry, photoluminescence)
- Optical characterization (optical loss measurements in guides or quality factor measurements in a microresonator)
3) Skills in valuing results by writing articles or presenting at conferences
4) other skills: written / spoken English, knowledge of Matlab programming

Work Context

This work will be carried out at the Microelectronics Technologies Laboratory (LTM), a joint research unit of the CNRS and the Grenoble Alpes University (UGA) (UMR 5129) located on the CEA-LETI-MINATEC site in Grenoble. A hundred people work at the LTM: 30 researchers or teacher-researchers, 18 engineers and technicians, 31 doctoral students and 16 post-doc. The laboratory's activities are positioned on the border between upstream academic research and industrial research. Over the years, the LTM has developed several direct partnerships with various players in the micro / nanoelectronics industry, notably STMicroelectronics in Crolles and Applied Materials in SAnta Clara (USA). The candidate will join the LTM's PROSPECT department. This department aims to develop innovative processes and materials for nano and opto electronics applications.
This project will be developed in close collaboration with the optical department of CEA / Leti (DOPT / Leti / CEA)

Constraints and risks

Clean room

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